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Clean Rooms - Focused ion beam (FIB)

Photograph of New Mountbatten at the University of Southampton (thumbnail). — © 2010 François-Xavier Beckers. Photograph made available under a http://creativecommons.org/licenses/by/3.0/ license.

Allows focused ion beam milling, electron-beam lithography and ion/electron beam-induced deposition, with parallel high resolution imaging, for the production of complex nanostructures in a broad range of materials. Specification: 0.9 nm electron beam and 5 nm ion beam resoultion - Gas injection for bea-induced deposition of gold and platinum - Nabity pattern generator - Electron - beam lithography capability - Kleidiek nanomanipulator for TEM sample lift-out (other tool options available inc. microfluidic injection and four-point electrical probe) - 5-axis motorized stage for samples up to 150mm dia. (larger without full rotation) and 20mm thick - Ability to accept complex CAD pattern files.

Contact

MACDONALD, KEVIN - +442380593085

Information

RCUK Costed:: Yes
School/Dept:: Physical Sciences and Engineering
Building:: New Mountbatten

Equipment

XF2 Insulator Enhanced Etch Gas Injector

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