Clean Rooms - Integrated Photonics
type: Facility
within: New Mountbatten
description: The Integrated Photonics Cleanroom is a 200m² Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing.
notation: F10010
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: SESSIONS, NEIL
facility is RCUK costed: true

New Mountbatten
type: Building
type: UoSBuilding
within: http://id.southampton.ac.uk/site/1
notation: 53
formal organization: id.southampton.ac.uk
lat: 50.93739
long: -1.39862
disabled go page: https://www.accessable.co.uk/university-of-southampton/access-guides/building-53-mountbatten
occupant: Physical Sciences and Engineering
occupant: FP
occupant: Optoelectronics Research Centre
occupant: F7FP040000
occupant: F7EH020000
occupant: F7FP060000
occupant: F7EH010000
occupant: F7EH040000
occupant: F7FP070000
lacks feature: residential
building architect: architect
building date: 2008
building feature: Clean rooms
spatial: POLYGON((-1.39913396019065 50.9372142159638,-1.39907008997395 50.9373032056671,-1.39891522041897 50.937259276929,-1.39890569827696 50.9372705987727,-1.39892932396893 50.9372784674524,-1.39859712697686 50.9377277159088,-1.39838674153732 50.93774396259,-1.3984577982763 50.937687410529,-1.39842294364327 50.9376771643524,-1.39822064304129 50.9376180648148,-1.39809892132029 50.937582514482,-1.39802930188577 50.9375621919069,-1.39799786085083 50.9375543798841,-1.3979582451468 50.9375445865492,-1.39795617902165 50.9375199050719,-1.39795384340191 50.9374888833799,-1.39795249592898 50.9374689004178,-1.39794872300479 50.9374351048503,-1.39794863317326 50.9374339726701,-1.39794486024907 50.9373881759563,-1.39794521957518 50.9373882891745,-1.39807691259583 50.93743340658,-1.39810988076676 50.9374439924643,-1.3983446105505 50.9371126021949,-1.39848726301762 50.9371526816356,-1.39856272150148 50.9370497091047,-1.39867465158588 50.9370818632785,-1.3986993552562 50.9370889960675,-1.39913396019065 50.9372142159638))

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 2304
width: 3456
file size: 3855820
aspect ratio: 1.5
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 666
width: 1000
file size: 116895
aspect ratio: 1.5015015015015
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 533
width: 800
file size: 79569
aspect ratio: 1.5009380863039
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 400
width: 600
file size: 48242
aspect ratio: 1.5
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 266
width: 400
file size: 24094
aspect ratio: 1.5037593984962
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 200
width: 300
file size: 14938
aspect ratio: 1.5
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 133
width: 200
file size: 7626
aspect ratio: 1.5037593984962
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 66
width: 100
file size: 2769
aspect ratio: 1.5151515151515
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 33
width: 50
file size: 1289
aspect ratio: 1.5151515151515
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 1280
width: 1920
file size: 348224
aspect ratio: 1.5
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 1066
width: 1600
file size: 258347
aspect ratio: 1.5009380863039
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 600
width: 800
file size: 87639
aspect ratio: 1.3333333333333
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 297
width: 480
file size: 31726
aspect ratio: 1.6161616161616
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 198
width: 320
file size: 15986
aspect ratio: 1.6161616161616
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 260
width: 240
file size: 14812
aspect ratio: 0.92307692307692
date: 2010

53.jpg
depicts: New Mountbatten
type: Image
license: http://creativecommons.org/licenses/by/3.0/
format: Format-JPEG
creator: http://id.ecs.soton.ac.uk/person/10955
height: 220
width: 220
file size: 12148
aspect ratio: 1
date: 2010

Physical Sciences and Engineering
type: OrganizationalUnit
type: Organization
notation: F7

Optoelectronics Research Centre
type: OrganizationalUnit
type: Organization
notation: EH

SESSIONS, NEIL
type: Agent

Nano 38 Sputting Machine Lesker Sputter System
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
notation: E10494
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: WF
primary contact: primary contact

Three Zone, Bench Top 1700C Tube Furnace
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
notation: E10373
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

MJB4 Mask Aligner
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
notation: E10362
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

MRF High Temperature Vacuum Furnace
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
description: This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen.
notation: E10321
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

Ionfab 300 Plus / Load Locked Ion Beam Etch System
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
description: Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target
notation: E10332
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

Auto 500 Electron Beam Deposition System
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
description: BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source
notation: E10305
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

Plasmalab System 400 / Magnetron Sputtering System
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
description: Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films.
notation: E10323
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

MA6 Mask Aligner
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
description: Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer
notation: E10329
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

KLA Tencor Alpha Step IQ Stylus Profier
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
description: The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8Å (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes.
notation: E10320
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

P-16+ Stylus Surface Profiler
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
description: The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials
notation: E10319
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

GX Custom FT-IR Spectrometer (obsolete 1718)
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: http://id.southampton.ac.uk/building/20
description: The Frontier¿ IR/NIR system enables you to benefit from faster method development and reduced instrument costs. This single optimized system provides unique mid-IR and near-IR dual range performance. Automated range switching, at the touch of a button, enables you to quickly move onto your next sample without manual reconfiguration, increasing your productivity.
notation: E10324
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

600C Environmental Oven
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
notation: E10316
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

Planar Air Bearing System
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
description: Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading.
notation: E10348
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

Plasmalab 80 Plus / Compact Modular Plasma System
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
description: Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2.
notation: E10322
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: GN
primary contact: primary contact

ZeMetrics ZeScope Optical Profiling System
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
notation: E10388
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: ~~
primary contact: primary contact

Nanolink DPN 5000 System
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
notation: E10387
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

PVA Tepla 300 Plasma System
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
notation: E10840
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: FP
primary contact: primary contact

Vertical Furnace
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
description: Vertical Furnace
notation: E11274
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

Flame Hydrolysis Deposition Chamber - 1 of 2
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
description: Flame Hydrolysis Deposition Chamber
notation: E11272
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact

Flame Hydrolysis Deposition Chamber - 2 of 2
related facility: Clean Rooms - Integrated Photonics
contact: secondary contact
type: Equipment
within: New Mountbatten
description: Flame Hydrolysis Deposition Chamber - 2 of 2
notation: E11273
formal organization: id.southampton.ac.uk
organization part: Physical Sciences and Engineering
organization part: Optoelectronics Research Centre
primary contact: primary contact